Adisyn achieves graphene breakthrough for semiconductors. ASX-listed Adisyn has successfully demonstrated continuous graphene formation at low temperatures using industrial Atomic Layer Deposition equipment, creating full coverage films on 1cm x 1cm coupons below the critical 450°C semiconductor thermal limit. This advancement addresses major limitations of traditional copper interconnects, including increasing resistance, heat generation, and power loss in advanced chips. The company's proprietary ALD methodology and precursor chemistry are designed to integrate into existing semiconductor manufacturing processes. Next steps include recipe optimization, repeatability trials, and scaling from coupon to wafer-level production.
